Abrasive Technology is pleased to introduce a diamond conditioning disk for in-situ pad conditioning in metal CMP processes.

Product Features:
• Capable of withstanding the harsh environment of
low pH metal CMP slurries.
• Successfully tested in slurries with pH levels as
low as 1.5 without bond degradation.
• High wafer throughput.
• Low cost of ownership.

These metal CMP disks are available in production quantities in various shapes and sizes for all production CMP platforms.

Main CMP Page
P.B.S.® Pad Conditioners
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Technical Papers and Product Brochure